The term thin film process controller references a thin film monitoring device’s ability to control the power supply connected to the Deposition Control Source (see diagram below). With this feature, the user can select the Source Power Supply Signal that will be used to control and automate deposition output for a particular process. Colnatec monitor systems with a control capability feature two Source Power Supply Signal outputs accessed via the I/O port. These outputs are classified as Source 1 and Source 2 in the Eon process control software.
For complete explanation of film thickness monitoring systems and Quartz Crystal Microbalances click here.
