QCM Research

Quartz crystal microbalances (QCMs) are widely used in thin-film deposition research for monitoring mass changes during processes such as atomic layer deposition (ALD), molecular beam epitaxy (MBE), and pulsed laser deposition (PLD).

Phillip Technologies manufactures high-precision quartz crystals used in deposition monitoring systems, including instruments developed by Colnatec. Because of this technical relationship, many research laboratories utilize Colnatec QCM systems operating with quartz crystals supplied by Phillip Technologies.

The publications below highlight peer-reviewed academic research where Colnatec quartz crystal microbalance systems were used to study thin-film growth, surface reactions, and deposition process behavior across a range of advanced materials applications.

Atomic Layer Deposition (ALD) Process Monitoring

300 mm ALD tool (FHR – ALD 300) for low temperature PEALD extended with customized Colnatec QCM Sensor

Summary Fraunhofer CNT integrated a customized Colnatec quartz crystal microbalance (QCM) sensor into a 300 mm PEALD system to monitor thin-film growth in real time. Colnatec QCM frequency shifts were used to generate precursor saturation curves for ozone and trimethylaluminum, enabling researchers to analyze ALD surface reactions and determine optimal process conditions. 

Featured Application

Real-time monitoring of atomic layer deposition reactions using a Colnatec QCM sensor. 

Understanding the Growth Mechanisms
of Multilayered
Systems in
Atomic Layer
Deposition Process

Summary

Researchers used a Colnatec quartz crystal microbalance (QCM) system to monitor mass changes during atomic layer deposition cycles while studying the growth mechanisms of multilayer thin films. The Colnatec QCM enabled real-time measurement of deposition behavior during alternating precursor exposures, providing insight into ALD reaction kinetics and multilayer film formation. 

Featured Application

Real-time monitoring of multilayer thin-film growth mechanisms during atomic layer deposition using a Colnatec QCM system. 

Impact of the
Sequence of
Precursor Introduction on Tin Oxide
Atomic Layer
Deposition

Summary

Researchers investigated the atomic layer deposition (ALD) growth behavior of tin oxide (SnO₂) films and how the sequence of precursor introduction influences thin-film formation and reaction kinetics. A Colnatec quartz crystal microbalance (QCM) system was used to monitor real-time mass changes during the ALD cycles, allowing the researchers to directly observe how different precursor exposure sequences affected deposition behavior and film growth mechanisms. 

Featured Application

Real-time monitoring of precursor reaction behavior and thin-film growth during atomic layer deposition using a Colnatec QCM system. 

Cost-Effective Systems for Atomic Layer Deposition

Summary

Researchers designed and tested two low-cost atomic layer deposition (ALD) systems capable of producing high-quality thin films with deposition performance comparable to commercial reactors. The advanced configuration incorporated a Colnatec quartz crystal microbalance (QCM) for in-situ monitoring of film growth, enabling real-time measurement of mass changes during ALD cycles. By integrating the Colnatec QCM into the reactor stage, the system directly tracked deposition behavior and verified thin-film growth rates of approximately 1 Å per cycle for alumina films.  

Featured Application

Real-time monitoring of thin-film deposition rates and atomic layer deposition growth behavior using a Colnatec quartz crystal microbalance (QCM) integrated directly into an ALD reactor system.

Investigating Surface Reaction Mechanisms in Atomic Layer Deposition Using In-Situ
Quartz Crystal Microbalance Measurements

Summary

This study examines reaction mechanisms occurring during atomic layer deposition (ALD) by analyzing mass changes during precursor exposure cycles. Researchers used a Colnatec quartz crystal microbalance (QCM) system integrated into the deposition environment to measure real-time mass changes during ALD processes. The Colnatec QCM enabled highly sensitive monitoring of precursor adsorption, surface reactions, and film growth behavior, allowing researchers to directly evaluate reaction kinetics and determine how deposition parameters influence thin-film growth mechanisms.

Featured Application

Real-time monitoring of surface reaction kinetics and thin-film growth during atomic layer deposition using an in-situ Colnatec quartz crystal microbalance (QCM) system.

Mechanistic Investigation of Atomic Layer Deposition Processes Using In-Situ Quartz Crystal Microbalance Measurements

Summary

This research examines reaction mechanisms and thin-film growth behavior during atomic layer deposition (ALD) by analyzing mass changes occurring during precursor exposure cycles. The researchers employed a Colnatec quartz crystal microbalance (QCM) to monitor real-time mass variations during the ALD process, allowing them to track adsorption events and surface reactions at extremely high sensitivity. Using the Colnatec QCM system, the study directly observed growth behavior during individual ALD cycles and evaluated how precursor chemistry and exposure conditions influence thin-film formation and deposition efficiency.

Featured Application

Real-time monitoring of surface reaction kinetics and thin-film growth during atomic layer deposition using an in-situ Colnatec quartz crystal microbalance (QCM) system.

Advanced Materials & Energy Materials Research

Atomic Layer Deposition of Bismuth Vanadates for Solar Energy Material

Summary

Researchers used a custom Colnatec quartz crystal microbalance (QCM) array to monitor atomic layer deposition of bismuth vanadate thin films for solar energy applications. The Colnatec system utilized RC-cut quartz crystals with aluminum electrodes to measure mass changes during ALD cycles, enabling detailed analysis of thin-film growth behavior.

Featured Application Real-time monitoring of atomic layer deposition of semiconductor oxide films using a Colnatec QCM system.

Thin Film Deposition & Growth Rate Monitoring

Formation of Copper Tin Sulfide Films by Pulsed Laser Deposition at 248 and 355 nm

Summary

This study compares pulsed laser deposition (PLD) growth of copper tin sulfide thin films using 248 nm and 355 nm UV lasers. The authors found that 355 nm deposition gave significantly higher growth rates, while lower fluence reduced droplet formation but shifted film composition away from stoichiometry. A Colnatec quartz crystal microbalance (QCM) was used to monitor deposition rate and estimate deposited thickness during the PLD process, supporting direct comparison of thin-film growth under different laser conditions.

Featured Application

Real-time monitoring of deposition rate and thickness during pulsed laser deposition using a Colnatec QCM system.

Molecular Beam Epitaxy (MBE) Flux & Process Control

Mixed polytype/polymorph formation in InSe films grown by molecular beam epitaxy on GaAs(111)B

Summary

This study examines the growth of InSe thin films on GaAs(111)B by molecular beam epitaxy (MBE) and shows how mixed polytypes and polymorphs formed during deposition strongly influenced the films’ structural and electronic properties. The researchers used a Colnatec quartz crystal microbalance (QCM) to measure indium and selenium fluxes during MBE growth, helping control deposition conditions while targeting smooth, layered InSe films with excellent nucleation behavior. The resulting films contained nanoscale domains of β-, γ-, and ε-InSe as well as a centrosymmetric polymorph, and these structural variations were shown to create substantial electronic disorder affecting charge transport.

Featured Application

Flux measurement and process control during molecular beam epitaxy using a Colnatec quartz crystal microbalance (QCM) system.